DOIONLINE 
DOIONLINE Publish In |
International Journal of Electrical, Electronics and Data Communication (IJEEDC)-IJEEDC |
 Journal Home Volume Issue |
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Issue |
Volume-4,Issue-6 ( Jun, 2016 ) | |||||||||
Paper Title |
Effect Of Annealing Temperature On The Properties Of Silver Films | |||||||||
Author Name |
Chia-Ching Wua, Chia-Hsuansua | |||||||||
Affilition |
Department of Electronic Engineering, Kao Yuan University, Kaohsiung, Taiwan, R.O.C. | |||||||||
Pages |
36-39 | |||||||||
Abstract |
This research presents silver (Ag) thin filmswere deposited on Corning Eagle XG glass substrate using a radio frequency (RF) magnetron sputtering technique. The high reflectivityAg thin films were deposited with different annealing temperature, even heating to 500 oC. In XRD patterns, all sample showed the characteristic peaks of Ag and only the face-centered cubic structure was found. The high thermal stability of the Ag thin film was developed and it could application on electron devices. Index Terms— Silver thin film, Surface morphology, Reflectivity, Annealing temperature. | |||||||||
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